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time controller

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Planar Alloy Sputtering Target

Planar Alloy Sputtering Target
Planar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ...

Rotary Ceramic Sputtering Target

Rotary Ceramic Sputtering Target
Rotary Ceramic Sputtering Target Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very ...

Planar Metal Sputtering Targets

Planar Metal Sputtering Targets
Planar Metal Sputtering Targets Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high ...
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