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Products > tube processing > Fujian Acetron New Materials CO. , Ltd | Similar Products

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tube processing

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Planar Alloy Sputtering Target: tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm ...

Rotary Ceramic Sputtering Target: process to ensure the overall uniformity of the target. Excellent electrical properties: Reliable atmosphere sintering enables stable electrical conductivity of oxides with semiconductor ...

Rotary Metal Sputtering Targets: processed by various methods to meet different needs. Rotary target Rotary target is a magnetically controlled target. The target is shaped like a cylinder containing a stationary magnet for ...

Planar Metal Sputtering Targets: processed by various methods to meet different needs. Rotary target Rotary target is a magnetically controlled target. The target is shaped like a cylinder containing a stationary magnet for ...

Planar Ceramic Sputtering Target: process to ensure the overall uniformity of the target. Excellent electrical properties: Reliable atmosphere sintering enables stable electrical conductivity of oxides with semiconductor ...

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Planar Alloy Sputtering Target