Video
Min. Order:
1
Place of origin:
United States
Price Condition:
EXW
Supply Ability:
200 units per year
Sputtering Deposition EquipmentAllwin21 Brochures: Plasma Asher Descum Equipment Allwin21 Brochures: Plasma Etcher RIE EquipmentAllwin21 Brochures: Thin Film MetrologyAllwin21 Brochures: Upgrade Kits Allwin21 Brochures: All ProductsPPT on Why AccuThermo AW 610M RTPPPT on Why AccuThermo AW820M RTPPPT on Why AW-105R Plasma Asher DescumPPT on Why AW-B3000 Barrel Batch Manual Asher DescumPPT on Why A
[Related Keywords : Mgage 300, Mgage 200, Metal Film Metrology, Suqare Sheet Resistance]
Business Type
Manufacturer
Location
California, United States
Employees Total
11 - 50
Annual Revenue
USD 5,000,001 - 10,000,0000
Min. Order:
1 Carat
Price:
US$ 1
Place of origin:
China
sputtering and electroplating processes is highly dependent on the purity and quality of the copper target material. Physical Properties Of Copper Target Density 8.92 g/cm3 Color Purplish red Melting point 1083.4℃ Boiling point 2567℃ The copper target is appropriate for various sputtering techniques, such as two-pole sputtering, three-pole sputtering, four-pole sputtering, RF sputtering, ion
[Related Keywords : electric fin tube]
Business Type
Manufacturer
Location
Henan, China
Employees Total
101 - 500
Annual Revenue
USD 5,000,001 - 10,000,0000
Competitive rf sputtering system products from various rf sputtering system manufacturers and rf sputtering system suppliers are listed above, please select quality and cheap items for you.
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