Min. Order:
1
Place of origin:
United States
Price Condition:
EXW
Supply Ability:
200 units per year
single wafer RTP system in 1982, the Heatpulse 210. In 1987, it produced the Heatpulse 610. These RTP systems run at atmospheric pressure and rely on a pre-process nitrogen or argon purge prior to wafer processing. They are still being used around the world in manufacturing, R&D and Universities. These RTP systems have a proven track record for reliability and simplicity.
Allwin21 Corp. is the ex
[Related Keywords : AG Associates, Heatpulse, Rapid Thermal Process, Rapid Thermal Annealing]