TIO2 Al2O3 ALD Atomic Layer Deposition Optical Coating Equipment ISO

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Supplier Info.

Company Name ZEIT Group
Membership Free member
Registration Date2022.12.12
Country/RegionChina
CityChengdu
Contact Ms. Tyra(Ms.)

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Product Attributes

- Place of Origin China
- Supply Type OEM Service
- Condition New
- Related Keywords Optical Coating Equipment

Description by Manufacturer

ALD Atomic Layer Deposition

Applications

Applications	Specific Purpose	ALD Material Type
MEMS devices	Etching barrier layer	Al₂O₃
	Protective layer	Al₂O₃
	Anti-bonding layer	TiO₂
	Hydrophobic layer	Al₂O₃
	Bonding layer	Al₂O₃
	Wear-resistant layer	Al₂O₃, TiO₂
	Anti-short circuit layer	Al₂O₃
	Charge dissipation layer	ZnO: Al
Electroluminescent display	Luminous layer	ZnS: Mn / Er
Electroluminescent display	Passivation layer	Al₂O₃
Storage materials	Ferroelectric materials	HfO₂
	Paramagnetic materials	Gd₂O₃, Er₂O₃, Dy₂O₃, Ho₂O₃
	Non-magnetic coupling	Ru, Ir
	Electrodes	Precious metals
Inductive coupling (ICP)	High-k gate dielectric layer	HfO₂, TiO₂, Ta₂O₅, ZrO₂
Crystalline silicon solar battery	Surface passivation	Al₂O₃
Perovskite thin-film battery	Buffer Layer	ZnxMnyO
Perovskite thin-film battery	Transparent conducting layer	ZnO: Al
3D Packaging	Through-Silicon-Vias (TSVs)	Cu, Ru, TiN
Luminous application	OLED passivation layer	Al₂O₃
Sensors	Passivation layer, filler materials	Al₂O₃, SiO₂
Medical Treatment	Biocompatible materials	Al₂O₃, TiO₂
Corrosion Protection layer	Surface corrosion protection layer	Al₂O₃
Fuel battery	Catalyst	Pt, Pd, Rh
Lithium battery	Electrode material protection layer	Al₂O₃
Hard disk read/write head	Passivation layer	Al₂O₃
Decorative Coating	Colored film, metallized film	Al₂O₃, TiO₂
Anti-discoloration coating	Precious metal anti-oxidation coating	Al₂O₃, TiO₂
Optical films	High-low refractive index	MgF₂, SiO₂, ZnS, TiO₂, Ta₂O₅, ZrO₂, HfO₂

Working Principle

Atomic layer deposition (ALD) is a method of depositing the substances on the surface of substrate in the form of

single atomic film layer by layer. Atomic layer deposition is similar to common chemical deposition, but in the process

of atomic layer deposition, the chemical reaction of a new layer of atomic film is directly associated with the previous

layer, so that only one layer of atoms is deposited in each reaction by this method.

Product Parameter

Model	ALD1200-500
Coating film system	AL₂O_3,TiO_2,ZnO, etc
Coating temperature range	Normal temperature to 500℃ (Customizable)
Coating vacuum chamber size	Inner diameter: 1200mm, Height: 500mm (Customizable)
Vacuum chamber structure	According to customer’s requirements
Background vacuum	<5×10^-7mbar
Coating thickness	≥0.15nm
Thickness control precision	±0.1nm
Coating size	200×200mm² / 400×400mm² / 1200×1200 mm², etc
Film thickness uniformity	≤±0.5%
Precursor and Carrier Gas	Trimethylaluminum, titanium tetrachloride, diethyl zinc, pure water, nitrogen, etc. ( C₃H₉Al, TiCl4, C₄HZn,H₂O,N₂, etc.)
Note: Customized production available.

Coating Samples

Process Steps
→ Place the substrate for coating into the vacuum chamber;
→ Vacuumize the vacuum chamber at high and low temperature, and rotate the substrate synchronously;
→ Start coating: the substrate is contacted with precursor in sequence and without simultaneous reaction;
→ Purge it with high-purity nitrogen gas after each reaction;
→ Stop rotating the substrate after the film thickness is up to standard and the operation of purging and cooling is

completed, then take out the substrate after the vacuum breaking conditions are met.

Our Advantages

We are manufacturer.

Mature process.

Reply within 24 working hours.

Our ISO Certification

TiO2 Al2O3 ALD Atomic Layer Deposition Optical Coating Equipment ISO 2

Parts Of Our Patents

TiO2 Al2O3 ALD Atomic Layer Deposition Optical Coating Equipment ISO 3

Parts Of Our Awards and Qualifications of R&D

TiO2 Al2O3 ALD Atomic Layer Deposition Optical Coating Equipment ISO 6

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Company Profile

About ZEIT Group

Membership Free member
Registration Date2022.12.12
Country/RegionChina
CityChengdu
Contact Ms. Tyra(Ms.)

ZEIT Group, founded in 2018, is a company focused on precision optics, semiconductor materials and high-tech intelligence equipments. Based on our advantages in precision machining of core and screen, optical detection and coating, ZEIT Group has been providing our customers with complete packages of customized and standardized product solutions.

Concentrated on technological innovations, ZEIT Group has more than 60 domestic patents by 2022 and established very close enterprise-college-research cooperations with institutes, universities and industrial association worldwide. Through innovations, self-owned intellectual properties and building up the key process experimental teams, ZEIT Group has become a development base for incubating high-tech products and a training base for high-end personnels.

Selling Categories

- Manufacturing & Processing Machinery >> Other Manufacturing & Processing Machinery

Keywords

Optical Coating Equipment

Registration Date	2022/12/12(Year/Month/Date)
Buyer / Seller in EC21	Seller
Business Type	Manufacturer
Year established	2018
Employees total	101 - 500
Annual revenue	USD 1,000,001 - 2,000,000

Contact Information Order Credit Report

Company	ZEIT Group
Address	Research Institute of Southwest Jiaotong University, Tianfu New District, Shuangliu District, Chengdu, Sichuan Province, P.R.ChinaChengduSichuan610000China
Phone	86 - 028 - 85723320
Fax	86 - 028 - 85723320
Homepage	www.optics-equipment.com/
Contact	Ms. Tyra

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