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  • Water Process

    Vertical Furnace for 300 -mm Wafers The VF-5900 furnace is a continuation of the VF-5300 model and has been developed to welcome the new age of 300-mm silicon wafers. The VF-5900 has a batch-processing system for the mass-handling of 300-mm wafers. Summary The VF-5900, designed to process 300-mm wafers, can accept a stack of 12 FOUPs (Front Opening Unified Pods) and can continuously process 2 b

    [Related Keywords : Water Process, Vertical Furnaces/LPCVD]

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