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  • Water Process

    Monitor cassette 2 Wafer transfer vacuumless Finger 5+1 Controller Model 1400 Applicable to SECS possible Applicable to AGV possible Applicable to SMIF/FOUP possible A Summary of Process Performance Pyro.Ox Thick film Pyro.Ox Thin film P-D-Poly Poly-Si HTO Si3N4 TEOS Reaction gas O2.H2 O2.H2 SiH4.PH3.H2 SiH4 SiH2Cl2.N2O SiH2Cl2.NH3 Si(C2H5O)4.O2 Growth temp.(deg.-c) 1000 - 1250 800 - 1000

    [Related Keywords : Water Process, Vertical Furnaces/LPCVD]

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