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Place of origin:
China
ALD Atomic Layer Deposition Applications Applications Specific Purpose ALD Material Type MEMS devices Etching barrier layer Al2O3 Protective layer Al2O3 Anti-bonding layer TiO2 Hydrophobic layer Al2O3 Bonding layer Al2O3 Wear-resistant layer Al2O3, TiO2 Anti-short circuit layer Al2O3 Charge dissipation layer ZnO: Al Electroluminescent display Luminous layer ZnS: Mn / Er Passivation layer Al2O3 St
[Related Keywords : Optical Coating Equipment]
Business Type
Manufacturer
Location
Sichuan, China
Employees Total
101 - 500
Annual Revenue
USD 1,000,001 - 2,000,000
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