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Place of origin:
China
ALD Atomic Layer Deposition Applications Applications Specific Purpose ALD Material Type MEMS devices Etching barrier layer Al2O3 Protective layer Al2O3 Anti-bonding layer TiO2 Hydrophobic layer Al2O3 Bonding layer Al2O3 Wear-resistant layer Al2O3, TiO2 Anti-short circuit layer Al2O3 Charge dissipation layer ZnO: Al Electroluminescent display Luminous layer ZnS: Mn / Er Passivation layer Al2O3 St
[Related Keywords : Optical Coating Equipment]
Business Type
Manufacturer
Location
Sichuan, China
Employees Total
101 - 500
Annual Revenue
USD 1,000,001 - 2,000,000
Min. Order:
10000 Metric Ton
Price:
US$ 23
Place of origin:
Malaysia
TiO2 (%) à 1.00 Iron as Fe2O3 (%) à 1.94 Sodium as Na2O (%) à 0.04 Potassium as K2O (%) à 1.70 Calcium as Cao (%) à 0.01 Magnesium as MgO (%) à 0.60 Phosphorus as P2O5 (%) à 0.03 Manganese as MnO (%) à 0.01 Chromium as Cr2O3 (%) à 0.01 Zirconium as ZrO2 (%) à 0.04 Hafnium as HfO2 (%) à 0.00 Sulphur as SO3 (%) à 0.00 Strontium as SrO (%) à 0.01 Loss on Ignition (%) (@1025°C) à 9.1 M
[Related Keywords : Ceramics tiles]
Business Type
Manufacturer
Location
Selangor, Malaysia
Employees Total
11 - 50
Annual Revenue
USD 2,000,001 - 5,000,000
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