Place of origin:
China
Alloy 99.99% / 99.999% / 99.9995% Planar Customized Ag Alloy 99.99% / 99.995% Planar Customized Au Alloy 99.99% / 99.999% Planar Customized Cu Alloy 99.99% / 99.999% Planar Customized Mo Alloy 99.95% Planar Customized Ni Alloy 99.99% Planar Customized Si Alloy 99.99% Planar / Rotary Customized Alloy sputtering targets play a crucial role in thin film deposition processes, enabling the fabrication
[Related Keywords : Sputtering Target]
Business Type
Manufacturer
Location
Fujian, China
Employees Total
101 - 500
Annual Revenue
USD 5,000,001 - 10,000,0000
Min. Order:
10 Kilogram
Price:
US$ 18 ~ 47
Place of origin:
China
targets: over 99%, relative density of alloy: over 97%; grain size: less than 50um; thermal resistance of films: below 5%; welded rate with back plates: over 98%, film uniformity after target film formation: over 95%. Conventional density: ≥8.5 g/cm3 For more information about niobium sputtering target please contact CS Titanium nb target manufacturer. Niobium Sputtering Target Specifications N
[Related Keywords : nb target]
Business Type
Manufacturer
Location
Shaanxi, China
Employees Total
51 - 100
Annual Revenue
USD 100,000 - 500,000
Place of origin:
China
Polished molybdenum plates exported to the United States Molybdenum sheet is widely used in reflection shield, cover plate applied in the sapphire growth furnace, reflection shield, heating tape, connecting pieces applied in vacuum furnace, sputtering target applied in plasma coating film, and high temperature resistance boat. When temperature is beyond 1200 degree centigrade, pure molybdenum wil
[Related Keywords : plate sheet rod]
Business Type
Manufacturer
Location
陕西, China
Employees Total
101 - 500
Annual Revenue
USD 5,000,001 - 10,000,0000
Place of origin:
China
Price Condition:
FOB
Sputtering Targets Materials list: Metal sputtering targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy), Erbium (Er), Europium (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, Carbon, (C), Hafnium (Hf), Holmium (Ho), Iridium (Ir), Indium (In), Iron (Fe), lanthanum (La), Lead (Pb), Lutetium
[Related Keywords : SI target, Silicon Target Material, target]
Business Type
Manufacturer
Location
Shanghai, China
Employees Total
101 - 500
Annual Revenue
USD 2,000,001 - 5,000,000
Competitive cu alloy sputtering target products from various cu alloy sputtering target manufacturers and cu alloy sputtering target suppliers are listed above, please select quality and cheap items for you.
 |
Recommended Content
