Place of origin:
China
SIMVACO’s vertical inline magnetron sputtering system is engineered to deliver high-transparency conductive films with superior efficiency and precision. With advanced features like high-throughput deposition and real-time process control, it is ideal for display manufacturing and flexible electronics applications. Vertical Inline Magnetron Sputtering Technology High-Precision Vertical Depositi
[Related Keywords : PVD Coating Machine, Magnetron Sputtering, Inline Coating System]
Business Type
Manufacturer
Location
Zhejiang, China
Employees Total
101 - 500
Annual Revenue
USD 10,000,001 - 50,000,000
Min. Order:
1 Set
Price:
US$ 2000000
Place of origin:
China
sputtering techniques, this production line ensures ultra-thin and uniform coating layers, ideal for applications requiring optical clarity or electrical conductivity. Customizable Layering Capabilities Whether it’s single-layer, multi-layer, or gradient coatings, the system’s flexible configuration accommodates complex production needs with ease, ensuring consistent results. Advanced Vacuum
[Related Keywords : PVD Coating Machine, Magnetron Sputtering, Vacuum Coating, Inline Coating System]
Business Type
Manufacturer
Location
Zhejiang, China
Employees Total
101 - 500
Annual Revenue
USD 10,000,001 - 50,000,000
Min. Order:
1 Piece
Price:
US$ 150 ~ 999
Place of origin:
China
Silicon targets can generally be divided into two types: single crystal and polycrystalline. The company uses Czochralski crystal growth technology and directional solidification growth technology to manufacture single crystal targets and polycrystalline targets. The product grains are uniform and the diameter can be up to 1000mm. It can be processed into various shapes such as rectangular and ci
[Related Keywords : Sputtering Target, Silicon Target, Si Target, Silicon products]
Business Type
Manufacturer
Location
Jiangsu, China
Employees Total
51 - 100
Annual Revenue
USD 100,000 - 500,000
Min. Order:
1 Unit
Price:
US$ 200000
Place of origin:
China
The magnetron multi arc sputtering coating machine generates glow discharge between the anode and cathode in a vacuum state, and gas molecules between the electrodes are ionized to generate charged charges. Positive ions are accelerated by the negative potential of the bright electrode and collide with the target material on the cathode, splashing out its atoms and other particles. The splashed a
[Related Keywords : Coating Machine]
Business Type
Manufacturer
Location
Guangdong, China
Employees Total
501 - 1000
Annual Revenue
More than 100,000,000
Min. Order:
1 Set
Price:
US$ 6700
Place of origin:
China
Supply Ability:
200 Sets per Month
Parameters： 1. Size of quartz chamber: 150X120MM2. Sample size: 70mm3. Sputtering size: 50mm4. Maximum vacuum: 5pa5. Gas usable: Inert gases such as hydrogen, nitrogen, etc.6. Maximum sputtering speed: 8nm/min7. Power: 200W8. Dimension: 360(W)X310(D)X150mm(H)9. With pumps and 1 target(Please contact me if you need the target for other materials)
[Related Keywords : sputter coater]
Business Type
Manufacturer
Location
å京, China
Employees Total
11 - 50
Annual Revenue
USD 500,001 - 1,000,000
Min. Order:
1 Unit
Price:
US$ 200000 ~ 500000
Place of origin:
China
Cathode multi-arc superposition magnetron sputtering composite vacuum metallizer machine is built around the design concept of high efficiency, energy saving and high yield. This equipment combines ion coating and medium frequency sputtering coating together to meet the needs of multi-purpose & different processes & different products & different materials. The equipment has been widely used by
[Related Keywords : vacuum coating, hardware coating, decorating coating]
Business Type
Manufacturer
Location
Shandong, China
Employees Total
101 - 500
Annual Revenue
USD 1,000,001 - 2,000,000
Min. Order:
1 Unit
Price:
US$ 200000 ~ 500000
Place of origin:
China
Magnetron sputtering metallizer is mainly used for decorative and functional reaction films, which has the advantages of high deposition rate and fast reaction speed, and completely overcomes the phenomenon of cathode target surface poisoning and abnormal glow discharge. Metallizing single-layer films, multi-layer composite films, etc. on metal and non-metal substrates. The updated cathode sputte
[Related Keywords : decorative coating, coating machine, PVD coating equipment]
Business Type
Manufacturer
Location
Shandong, China
Employees Total
101 - 500
Annual Revenue
USD 1,000,001 - 2,000,000
Min. Order:
1 Piece
Price:
US$ 50
Place of origin:
China
High Purity 99.99% Nickel Chromium Alloy Targets NiCr20wt% Sputtering Targets for Film Coating Name NiCr20wt% Sputtering Targets Purity 99.99% Size D50.8x3mm, Or customize size Application Industry,experiemnts,film coating,semidonductor etc Shape:Round or rectangularTechnology:Vacuum meltingApplication:PVD coating industryPackaging:Vacuum package, export carton or wooden case outsideRelated produ
[Related Keywords : Nickel Chromium Target, NiCr20wt% NiCr30wt%, NiCr Alloy]
Business Type
Manufacturer
Location
Hunan, China
Employees Total
51 - 100
Annual Revenue
USD 2,000,001 - 5,000,000
Min. Order:
1 Piece
Price:
US$ 50
Place of origin:
China
Supply Ability:
60,000 Set/ Sets per Month
OEM Nickel chromium alloy Rotary Target NiCr Alloy Pipe NiCr10 NiCr20 NiCr30 Nickel Chromium Alloy Targets for Vapor deposited thin filmPurity99.99%-99.999%Size0.1mm, 0.2mm,0.5mm Other OEM sizeApplicationvacuum coating
[Related Keywords : NiCr Alloy, Nickel Chromium Alloy Tar, NiCr Sputtering Target]
Business Type
Manufacturer
Location
Hunan, China
Employees Total
51 - 100
Annual Revenue
USD 2,000,001 - 5,000,000
Place of origin:
China
Planar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlle
[Related Keywords : Sputtering Target]
Business Type
Manufacturer
Location
Fujian, China
Employees Total
101 - 500
Annual Revenue
USD 5,000,001 - 10,000,0000
Video
Min. Order:
1
Place of origin:
United States
Price Condition:
EXW
Supply Ability:
200 units per year
Allwin21 Brochures: Sputtering Deposition Equipment PPT on Why AccuSputter AW4450 Sputter Deposition Equipment Video on AccuSputter AW4450 Sputter Deposition Equipment Allwin21 Brochures: Upgrade Kits Allwin21 Corp. has been focusing on providing solutions and enhancements to Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450, Perkin-Elmer 4480 used sputter deposition semiconductor processe
[Related Keywords : Perkin-Elmer 4400, Perkin-ELmer 4410, Perkin-Elmer 4450, Perkin-Elmer 2400]
Business Type
Manufacturer
Location
California, United States
Employees Total
11 - 50
Annual Revenue
USD 5,000,001 - 10,000,0000
Video
Min. Order:
1
Place of origin:
United States
Price Condition:
EXW
Supply Ability:
200 units per year
Allwin21 Brochures: Sputtering Deposition Equipment PPT on Why AccuSputter AW4450 Sputter Deposition Equipment Video on AccuSputter AW4450 Sputter Deposition Equipment Allwin21 Brochures: Upgrade Kits Manufacturer: Allwin21 Corp.Condition: NewWafer Size: Small~8 inchWafer loading: Manual, with Load LockCathodes: 1~3 x Delta Shape OR 1~4 x 8″ Circle ShapeSputter Methods: RF (RG VII: Air cooling
[Related Keywords : Sputter, Thin Film Deposition, Physical Vapor Deposition, Magnetron Sputter]
Business Type
Manufacturer
Location
California, United States
Employees Total
11 - 50
Annual Revenue
USD 5,000,001 - 10,000,0000
Min. Order:
10 Kilogram
Price:
US$ 18 ~ 47
Place of origin:
China
sputtering target please contact CS Titanium nb target manufacturer. Niobium Sputtering Target Specifications Niobium Target Parameters Recrystallization 95％min Grain size ASTM 4 or finer Surface finish 16Rms max. or Ra 0.4 ( RMS64 or better) Flatness 0.1mm or 0.15％ max Tolerance +/-0.010" on all dimensions Impurity Content (powder) Ta ≤500ppm Cr ≤20ppm N ≤370ppm H ≤19ppm Ni
[Related Keywords : nb target]
Business Type
Manufacturer
Location
Shaanxi, China
Employees Total
51 - 100
Annual Revenue
USD 100,000 - 500,000
Place of origin:
China
Rotary Ceramic Sputtering Target Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Al
[Related Keywords : Sputtering Target]
Business Type
Manufacturer
Location
Fujian, China
Employees Total
101 - 500
Annual Revenue
USD 5,000,001 - 10,000,0000
Place of origin:
China
Rotary Metal Sputtering Targets Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also
[Related Keywords : Sputtering Targets]
Business Type
Manufacturer
Location
Fujian, China
Employees Total
101 - 500
Annual Revenue
USD 5,000,001 - 10,000,0000
Place of origin:
China
Planar Metal Sputtering Targets Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also
[Related Keywords : Sputtering Targets]
Business Type
Manufacturer
Location
Fujian, China
Employees Total
101 - 500
Annual Revenue
USD 5,000,001 - 10,000,0000
Place of origin:
China
Planar Ceramic Sputtering Target Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Al
[Related Keywords : Sputtering Target]
Business Type
Manufacturer
Location
Fujian, China
Employees Total
101 - 500
Annual Revenue
USD 5,000,001 - 10,000,0000
Min. Order:
1 Set
Price:
US$ 4500
Place of origin:
China
Supply Ability:
30000set per year
sputtering rate and yield of wafers. Materials lifetime can reach more than 3600KWH which is twice times compared with the targets in traditional processes. The main parameters of the products are in good control. Specs 名称Targets 纯度Purity 晶粒Grain Size 偏析度Segregation Degree 8 inch 12 inch 1 Cu target 5N/6N <1um N/A Release Release 2 CuAl target 6N <1um ≤5% Release Release 3 Cu
[Related Keywords : sputtering target, copper sputtering target, copper target, 6n copper target]
Business Type
Manufacturer
Location
Zhejiang, China
Employees Total
51 - 100
Annual Revenue
USD 1,000,001 - 2,000,000
Min. Order:
1
Price:
USD 120000
Place of origin:
China
Price Condition:
FOB Shanghai
Supply Ability:
15 sets per month
The MSC1616 magnetron sputtering coating machine, is designed exclusively for ABS tableware: spoon, fork, knife's application. Its 2-door structure design highly enhance the productivity. APPLICATIONS: DECORATIVE coating, : specialized on glass and plastic substrates coatings. High Light of Equipment: 1. PLC + Touch Screen Operation System( coating processes can be saved automatically in th
[Related Keywords : vacuum coating machine, DC magnetron sputtering, PVD vacuum coating machine, ABS coating by sputtering]
Business Type
Manufacturer
Location
Shanghai, China
Employees Total
11 - 50
Annual Revenue
USD 5,000,001 - 10,000,0000
Place of origin:
China
Price Condition:
FOB
Main technical indexes: 1. ultimate vacuum: ≤6.6X10³Pa 2. vacuum acquisition system adopts molecular pump + mechanical pump unit 3. continuous pumping for 30 minutes, the vacuum degree is less than or equal to 8x10³Pa 4. cylindrical sputtering targets can work independently or at the same time The 5. substrate ≤60mm in diameter, can be heated to ≤700℃, with water coolin
[Related Keywords : Magnetron, Sputtering]
Business Type
Manufacturer
Location
Shanghai, China
Employees Total
11 - 50
Annual Revenue
USD 100,000 - 500,000
Competitive sputtering products from various sputtering manufacturers and sputtering suppliers are listed above, please select quality and cheap items for you.
Besides, we also provide you with related products such as target for your choice.
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