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Silicon targets can generally be divided into two types: single crystal and polycrystalline. The company uses Czochralski crystal growth technology and directional solidification growth technology to...
Planar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to...
Rotary Ceramic Sputtering Target Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very...
Rotary Metal Sputtering Targets Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high...
Planar Metal Sputtering Targets Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high...
Planar Ceramic Sputtering Target Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very...
By using designed exclusively water-cooled crucible maglev melting furnace and IPAS technology , Cowin Semicon is producing high-purity copper target which has uniform structure with average size...
Application: Cu interconnect seed layer;UBM;TSV, etc. Ingredients : Cu Purity: ≧99.999% Specification: The size and tolerance of the targets and penstocks are in line with the requirements of the...
Product: NiV93/7wt% sputtering target Purity: 99.95% Size: customized Shape: round or rectangular Technology: vacuum melting Application: pvd coating industry Packaging: vacuum package, export...
Please contact us Wechat and whatsapp:008615857495000 Please contact us for more info if you are intertested. NINGBO SEN AO ELECTRONIC tech. Daniel chen We are leading technology company in...
Please contact us Wechat and whatsapp:008615857495000 Please contact us for more info if you are intertested. NINGBO SEN AO ELECTRONIC tech. Daniel chen We are leading technology company in...
Please contact us Wechat and whatsapp:008615857495000 Please contact us for more info if you are intertested. NINGBO SEN AO ELECTRONIC tech. Daniel chen We are leading technology company in...
We are highly acclaimed as suppliers and distributors of sputtering targets. Our products are known for better service livesand we are providing a full line of sputtering targets with various...
Purity: Si 99.999% min. Resistity: 0.2 ohm/cm min. Type: both Single Crystal Silicon Target and Poly Crystal Silicon Targets can be supplied.
Purity:2N5,3N5 Density:7.15g/cm3 Specification:As Requested Processing Method:HIP
Purity:3N5 Min. Density:19.3g/cm3 Standard:ASTMB760 ,GB/T3875-83 Specification:As Requested Melting Point:3410°C
Purity Processing Method Roughness Specification Density Tolerance 2N5min. Forged 1.6μm As requested 6.5g/cm3 ±0.1-0.2mm